Adjustment of electron temperature in ECR microwave plasmaZHAN, Ru-Juan; XIAOHUI WEN; XIAODONG ZHU et al.Vacuum. 2003, Vol 70, Num 4, pp 499-503, issn 0042-207X, 5 p.Article

CEMS investigations of AISI M2 steel after ion implantation by nitrogen, boron and carbonKHOLMETSKII, A. L; ANISCHIK, V. M; UGLOV, V. V et al.Vacuum. 2003, Vol 69, Num 4, pp 521-527, issn 0042-207X, 7 p.Article

Electron beam surface treatment. Part I: surface hardening of AISI D3 tool steelSONG, R. G; ZHANG, K; CHEN, G. N et al.Vacuum. 2003, Vol 69, Num 4, pp 513-516, issn 0042-207X, 4 p.Article

Plasma polymers prepared by RF sputtering of polyethyleneKHOLODKOV, I; BIEDERMAN, H; SLAVINSKA, D et al.Vacuum. 2003, Vol 70, Num 4, pp 505-509, issn 0042-207X, 5 p.Article

Reduction of droplet of tantalum oxide using double slit in pulsed laser depositionHINO, T; MUSTOFA, S; NISHIDA, M et al.Vacuum. 2003, Vol 70, Num 1, pp 47-52, issn 0042-207X, 6 p.Article

Field emission characteristics of high-energy ion-irradiated polycrystalline diamond thin filmsPANDEY, P. T; SHARMA, G. L; AWASTHI, D. K et al.Vacuum. 2003, Vol 72, Num 3, pp 297-305, issn 0042-207X, 9 p.Article

Investigation of a pulsed magnetron sputtering discharge with a vacuum pentode modulator power supplyKUZMICHEV, Anatoly; SIDORENKO, Sergey; STEFFEN, Hartmut et al.Vacuum. 2003, Vol 72, Num 1, pp 59-69, issn 0042-207X, 11 p.Article

Investigation on the structure of TiO₂ films sputtered on alloy substratesGU, Guang-Rui; LI, Ying-Ai; TAO, Yan-Chun et al.Vacuum. 2003, Vol 71, Num 4, pp 487-490, issn 0042-207X, 4 p.Article

Separation of IPA/water mixtures by pervaporation: sorption and pervaporation resultsHILMIOGLU, Nilüfer Durmaz; TULBENTCI, Sema.Vacuum. 2003, Vol 72, Num 1, pp 35-40, issn 0042-207X, 6 p.Article

Surface morphology effects of post-implantation annealing in thin amorphous films of the As-Se systemTSVETKOVA, T; BALABANOV, S; SKORDEVA, E et al.Vacuum. 2003, Vol 72, Num 2, pp 143-147, issn 0042-207X, 5 p.Article

Transmission functions of an energy-mass spectrometer and energy spectra vs. emission angle data for silicon secondary ionsSONG, Y. W; NASRETDINOV, A. A; KHRUSTACHEV, I. K et al.Vacuum. 2003, Vol 72, Num 3, pp 257-262, issn 0042-207X, 6 p.Article

The international symposium on ion implantation and other applications of ions and electrons - ION 2002, 10-13 June 2002, Kazimierz Dolny, PolandMICHALAK, Leszek; MACZKA, Dariusz; ZUK, Jerzy et al.Vacuum. 2003, Vol 70, Num 2-3, issn 0042-207X, 407 p.Conference Proceedings

Influence of amorphization-recrystallization processes on distribution of selenium and oxygen atoms implanted in siliconTISHKOVSKY, Eugene; FEKLISTOV, Konstantin; TASKIN, Alexey et al.Vacuum. 2003, Vol 70, Num 2-3, pp 153-156, issn 0042-207X, 4 p.Conference Paper

Ion beam assisted deposition of metal layers using a novel one beam systemKOMAROV, F. F; KAMAROU, A. A; ZUKOWSKI, P et al.Vacuum. 2003, Vol 70, Num 2-3, pp 215-220, issn 0042-207X, 6 p.Conference Paper

Compressive plasma flows interaction with steel surface: structure and mechanical properties of modified layerANISHCHIK, V. M; UGLOV, V. V; ASTASHYNSKI, V. V et al.Vacuum. 2003, Vol 70, Num 2-3, pp 269-274, issn 0042-207X, 6 p.Conference Paper

Characteristics of surface and film morphology in the IBAD deposition process: a Monte Carlo simulation studyOLESZKIEWICZ, Waldemar; ROMISZOWSKI, Piotr.Vacuum. 2003, Vol 70, Num 2-3, pp 347-352, issn 0042-207X, 6 p.Conference Paper

Accelerator mass spectrometry: an overviewHELLBORG, R; FAARINEN, M; KIISK, M et al.Vacuum. 2003, Vol 70, Num 2-3, pp 365-372, issn 0042-207X, 8 p.Conference Paper

Influence of Pd-Co bimetallic interaction on CO adsorption properties of Pd_xCo_1-x alloys: XPS, TPD and static SIMS studiesMATOLINOVA, I; FABIK, S; MASEK, K et al.Vacuum. 2003, Vol 71, Num 1-2, pp 41-45, issn 0042-207X, 5 p.Conference Paper

H density in a hydrogen plasma post-glow reactorMOZETIC, Miran; VESEL, Alenka; MONNA, Virginie et al.Vacuum. 2003, Vol 71, Num 1-2, pp 201-205, issn 0042-207X, 5 p.Conference Paper

Discharge characteristics of magnetron cells with different lengths in ultrahigh vacuumVESEL, Alenka; MOZETIC, Miran; ZALAR, Anton et al.Vacuum. 2003, Vol 71, Num 1-2, pp 225-228, issn 0042-207X, 4 p.Conference Paper

In-band EUV radiation of ablative capillary discharges in PVCANDREIC, Z; ELLWI, S; PLESLIC, S et al.Vacuum. 2003, Vol 71, Num 1-2, pp 229-232, issn 0042-207X, 4 p.Conference Paper

AFM and AUGER investigations of as-deposited and heat treated copper coatings on glassy carbon surfaces with titanium intermediate layersNEUBAUER, E; EISENMENGER-SITTNER, C; BANGERT, H et al.Vacuum. 2003, Vol 71, Num 1-2, pp 293-298, issn 0042-207X, 6 p.Conference Paper

Dust particle formation in low pressure Ar/CH₄ and Ar/C₂H₂ discharges used for thin film depositionBERNDT, J; HONG, S; KOVACEVIC, E et al.Vacuum. 2003, Vol 71, Num 3, pp 377-380, issn 0042-207X, 4 p.Conference Paper

Reconstruction of low-count step-like signals in ion microbeam analysisKOVACS, Miklos; KANTOR, Zoltan; SIMON, Aliz et al.Vacuum. 2003, Vol 71, Num 1-2, pp 53-57, issn 0042-207X, 5 p.Conference Paper

Thermal stability of PVD hard coatingsMITTERER, C; MAYRHOFER, P. H; MUSIL, J et al.Vacuum. 2003, Vol 71, Num 1-2, pp 279-284, issn 0042-207X, 6 p.Conference Paper